1/f noise and incipient localization

O. Cohen*, Z. Ovadyahu, M. Rokni

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

50 Scopus citations

Abstract

The magnitude of the 1/f noise in indium oxide films and ZnO accumulation layers is studied as a function of static disorder. The noise level, of both systems, is much higher than in typical metals even for the diffusive regime. The correlation between noise and static disorder leads us to suggest tht incipient localization may play an important role in determining the noise characteristics of diffusive systems near an Anderson transition.

Original languageEnglish
Pages (from-to)3555-3558
Number of pages4
JournalPhysical Review Letters
Volume69
Issue number24
DOIs
StatePublished - 1992

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