A New Calix[4]arene-Based Barium Precursor for BaO-TiO2 Thin Film Deposition

Vladimir Burtman, Shlomo Yitzchaik*, Oleg Aleksiuk, Guilia Meshulam, Garry Berkovic, Zvi Kotler

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


In the present work we describe the design, syntheses, and use of a new barium metalloorganic precursor for barium titanate thin film deposition. Barium-containing thin films deposited by different deposition methods are widely used for various applications in optics and electronics. An important goal for applications is concerned with the production of stable, fluorine free barium-metalloorganic precursor materials, to obtain better performance photonic devices. We describe an alternative barium-metalloorganic precursor based on a calixarene ligand, its application to dip coating and thin film growth of the BaO-TiO2 family of compounds, and studies of these films by second harmonic generation. The BaTiO3 films showed promising nonlinear optical response for guided wave-applications.

Original languageAmerican English
Pages (from-to)3101-3106
Number of pages6
JournalChemistry of Materials
Issue number12
StatePublished - Dec 1997


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