A New Calix[4]arene-Based Barium Precursor for BaO-TiO2 Thin Film Deposition

Vladimir Burtman; Shlomo Yitzchaik; Oleg Aleksiuk; Guilia Meshulam; Garry Berkovic; Zvi Kotler

doi:10.1021/cm9704490

A New Calix[4]arene-Based Barium Precursor for BaO-TiO₂ Thin Film Deposition

Vladimir Burtman, Shlomo Yitzchaik^*, Oleg Aleksiuk, Guilia Meshulam, Garry Berkovic, Zvi Kotler

^*Corresponding author for this work

Institute of Chemistry

Research output: Contribution to journal › Article › peer-review

Abstract

In the present work we describe the design, syntheses, and use of a new barium metalloorganic precursor for barium titanate thin film deposition. Barium-containing thin films deposited by different deposition methods are widely used for various applications in optics and electronics. An important goal for applications is concerned with the production of stable, fluorine free barium-metalloorganic precursor materials, to obtain better performance photonic devices. We describe an alternative barium-metalloorganic precursor based on a calixarene ligand, its application to dip coating and thin film growth of the BaO-TiO₂ family of compounds, and studies of these films by second harmonic generation. The BaTiO₃ films showed promising nonlinear optical response for guided wave-applications.

Original language	English
Pages (from-to)	3101-3106
Number of pages	6
Journal	Chemistry of Materials
Volume	9
Issue number	12
DOIs	https://doi.org/10.1021/cm9704490
State	Published - Dec 1997

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abstract = "In the present work we describe the design, syntheses, and use of a new barium metalloorganic precursor for barium titanate thin film deposition. Barium-containing thin films deposited by different deposition methods are widely used for various applications in optics and electronics. An important goal for applications is concerned with the production of stable, fluorine free barium-metalloorganic precursor materials, to obtain better performance photonic devices. We describe an alternative barium-metalloorganic precursor based on a calixarene ligand, its application to dip coating and thin film growth of the BaO-TiO2 family of compounds, and studies of these films by second harmonic generation. The BaTiO3 films showed promising nonlinear optical response for guided wave-applications.",

author = "Vladimir Burtman and Shlomo Yitzchaik and Oleg Aleksiuk and Guilia Meshulam and Garry Berkovic and Zvi Kotler",

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AU - Burtman, Vladimir

AU - Yitzchaik, Shlomo

AU - Aleksiuk, Oleg

AU - Meshulam, Guilia

AU - Berkovic, Garry

AU - Kotler, Zvi

PY - 1997/12

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AB - In the present work we describe the design, syntheses, and use of a new barium metalloorganic precursor for barium titanate thin film deposition. Barium-containing thin films deposited by different deposition methods are widely used for various applications in optics and electronics. An important goal for applications is concerned with the production of stable, fluorine free barium-metalloorganic precursor materials, to obtain better performance photonic devices. We describe an alternative barium-metalloorganic precursor based on a calixarene ligand, its application to dip coating and thin film growth of the BaO-TiO2 family of compounds, and studies of these films by second harmonic generation. The BaTiO3 films showed promising nonlinear optical response for guided wave-applications.

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A New Calix[4]arene-Based Barium Precursor for BaO-TiO₂ Thin Film Deposition

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