A study of the electronic structure of a-Si:H by tunneling

I. Balberg*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Measurements of the tunneling and phototunneling I-V and G-V characteristics have enabled the study of the distribution of states in the band-gap of hydrogenated amorpous silicon. It is found that regardless of the method of preparation and the material dopants there is a peak in the bulk and surface density of states which lies 0.45 eV below the conduction band edge. The density of states at the peak is concluded to be 1018 - 1019 cm-3 eV-1, decreasing by at least an order of magnitude for energies below and above this peak.

Original languageEnglish
Pages (from-to)605-610
Number of pages6
JournalJournal of Non-Crystalline Solids
Volume35-36
Issue numberPART 1
DOIs
StatePublished - 1980
Externally publishedYes

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