AFM characterization of the structure of Au-colloid monolayers and their chemical etching

Modification of a glass support with triethoxy propylaminosilane yields an active interface for the assembly of Au colloids. The colloids are imaged by AFM using a low applied load (0.5-0.7 nN). The lateral Au-colloid dimensions, 33 ± 3 nm, deviate from the particle dimensions determined by TEM (19 ± 2 nm) and absorption spectroscopy (15nm). This deviation is attributed to the intrinsic curvature of the AFM tip. Application of higher loads on the tip (3 nN) results in the sweeping of Au colloids from the monolayer. The Au colloid monolayer is etched in the presence of CN^-. The etching proceeds by the initial coincidental etching of Au particles followed by the kinetically favored etching of particles at the edges of the etched domains. This provides means for the micro machining and the chemical manipulation of Au colloids of controlled spatial arrangement.