An alternative approach for direct apc using scatterometry data

Boaz Brill, Yoel Cohen, Igor Turovets, Dario Elyasy, Tzevi Beatus

Research output: Contribution to journalArticlepeer-review

Abstract

Scatterometry is a promising method, capable of providing accurate profile information for a large range of applications. However, applying scatterometry to the production environment and applying it to APC is still difficult. In this paper we propose an alternative approach in which we apply a Neural Network to directly correlate scatterometry raw data and the lithography process control parameters. The proposed method is much easier to use than normal scatterometry, and can therefore be applied to APC much faster.

Original languageAmerican English
Pages (from-to)765-768
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4689 II
DOIs
StatePublished - 2002
Externally publishedYes

Keywords

  • Apc
  • Lithography
  • Neural network
  • Process control
  • Scatterometry

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