Atomic layer deposition of enantioselective thin film of alumina on chiral self-assembled-monolayer

Hagay Moshe, Gila Levi, Daniel Sharon, Yitzhak Mastai*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

In this paper, we describe the synthesis of new chiral nanosized surfaces based on chiral self-assembled monolayers coated with metal oxide (Al2O3) nanolayers. In this new type of nanosized chiral surface, the Al2O3 nanolayers enable the protection of the chiral self-assembled monolayers while preserving their enantioselective nature. The chiral nature of the SAMs/Al2O3 films was characterized by a variety of techniques, such as, quartz crystal microbalance, circular dichroism (CD) spectroscopy and chiral crystallization. The proposed methodology for the preparation of nanoscale chiral surfaces described in this article could open up opportunities in other fields of chemistry, such as chiral catalysis.

Original languageAmerican English
Pages (from-to)88-93
Number of pages6
JournalSurface Science
Volume629
DOIs
StatePublished - Nov 2014
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2014 Elsevier B.V.

Keywords

  • AlO
  • Chiral self-assembled monolayers
  • Chiral surfaces
  • Enantioselective crystallization

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