Combined millimeter-wave near-field microscope and capacitance distance control for the quantitative mapping of sheet resistance of conducting layers

A. F. Lann, M. Golosovsky, D. Davidov, A. Frenkel

Research output: Contribution to journalArticlepeer-review

47 Scopus citations

Abstract

We present a dual-frequency electromagnetic scanning probe and apply it for quantitative mapping of the sheet resistance of conducting films. The high-frequency (82 GHz) mode is used for image acquisition, while the low-frequency (5 MHz) mode is used for distance control. We measure magnitude and phase of the near-field microwave reflectivity from conducting films of varying thickness and develop a model which accounts fairly well for our results. This brings us to a quantitative understanding of the contrast in the microwave near-field imaging using an aperture probe, and allows us to achieve quantitative contactless characterization of conducting layers with sheet resistance even below 2.

Original languageEnglish
Pages (from-to)2832-2834
Number of pages3
JournalApplied Physics Letters
Volume73
Issue number19
DOIs
StatePublished - 1998

Fingerprint

Dive into the research topics of 'Combined millimeter-wave near-field microscope and capacitance distance control for the quantitative mapping of sheet resistance of conducting layers'. Together they form a unique fingerprint.

Cite this