Abstract
We present a dual-frequency electromagnetic scanning probe and apply it for quantitative mapping of the sheet resistance of conducting films. The high-frequency (82 GHz) mode is used for image acquisition, while the low-frequency (5 MHz) mode is used for distance control. We measure magnitude and phase of the near-field microwave reflectivity from conducting films of varying thickness and develop a model which accounts fairly well for our results. This brings us to a quantitative understanding of the contrast in the microwave near-field imaging using an aperture probe, and allows us to achieve quantitative contactless characterization of conducting layers with sheet resistance even below 2.
Original language | English |
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Pages (from-to) | 2832-2834 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 73 |
Issue number | 19 |
DOIs | |
State | Published - 1998 |