Design methodology of refractive index engineering by implantation of high-energy particles in electro-optic materials

Alexander Gumennik; Har'el Ilan; Roei Fathei; Abraham Israel; Aharon J. Agranat; Igal Shachar; Michael Hass

doi:10.1364/AO.46.004132

Design methodology of refractive index engineering by implantation of high-energy particles in electro-optic materials

Alexander Gumennik^*, Har'el Ilan, Roei Fathei, Abraham Israel, Aharon J. Agranat, Igal Shachar, Michael Hass

^*Corresponding author for this work

Department of Applied Physics

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

Slab waveguides were constructed in K_1-x-Li_xTa _1-yNb_yO₃ crystals by the implantation of ¹²C⁺⁴ ions at 30 MeV and ¹⁶O⁺⁵ ions at 30 and 40 MeV. The waveguides were characterized by a prism coupler setup. A refractive index drop of 10.9% was observed in a layer formed by the implantation of ¹⁶O⁺⁵ ions at 30 MeV. The carbon-implanted waveguides were found to be thermally stable after annealing at 450 °C A semiempirical formula for predicting the change in the refractive index given the parameters of the implantation process was developed. It is argued that the combination of the basic implantation process with the semiempirical formula can be developed to become a generic method for constructing complex electro-optic circuits with a wave-guided architecture.

Original language	English
Pages (from-to)	4132-4137
Number of pages	6
Journal	Applied Optics
Volume	46
Issue number	19
DOIs	https://doi.org/10.1364/AO.46.004132
State	Published - 1 Jul 2007

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title = "Design methodology of refractive index engineering by implantation of high-energy particles in electro-optic materials",

abstract = "Slab waveguides were constructed in K1-x-LixTa 1-yNbyO3 crystals by the implantation of 12C+4 ions at 30 MeV and 16O+5 ions at 30 and 40 MeV. The waveguides were characterized by a prism coupler setup. A refractive index drop of 10.9% was observed in a layer formed by the implantation of 16O+5 ions at 30 MeV. The carbon-implanted waveguides were found to be thermally stable after annealing at 450 °C A semiempirical formula for predicting the change in the refractive index given the parameters of the implantation process was developed. It is argued that the combination of the basic implantation process with the semiempirical formula can be developed to become a generic method for constructing complex electro-optic circuits with a wave-guided architecture.",

author = "Alexander Gumennik and Har'el Ilan and Roei Fathei and Abraham Israel and Agranat, {Aharon J.} and Igal Shachar and Michael Hass",

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T1 - Design methodology of refractive index engineering by implantation of high-energy particles in electro-optic materials

AU - Gumennik, Alexander

AU - Ilan, Har'el

AU - Fathei, Roei

AU - Israel, Abraham

AU - Agranat, Aharon J.

AU - Shachar, Igal

AU - Hass, Michael

PY - 2007/7/1

Y1 - 2007/7/1

N2 - Slab waveguides were constructed in K1-x-LixTa 1-yNbyO3 crystals by the implantation of 12C+4 ions at 30 MeV and 16O+5 ions at 30 and 40 MeV. The waveguides were characterized by a prism coupler setup. A refractive index drop of 10.9% was observed in a layer formed by the implantation of 16O+5 ions at 30 MeV. The carbon-implanted waveguides were found to be thermally stable after annealing at 450 °C A semiempirical formula for predicting the change in the refractive index given the parameters of the implantation process was developed. It is argued that the combination of the basic implantation process with the semiempirical formula can be developed to become a generic method for constructing complex electro-optic circuits with a wave-guided architecture.

AB - Slab waveguides were constructed in K1-x-LixTa 1-yNbyO3 crystals by the implantation of 12C+4 ions at 30 MeV and 16O+5 ions at 30 and 40 MeV. The waveguides were characterized by a prism coupler setup. A refractive index drop of 10.9% was observed in a layer formed by the implantation of 16O+5 ions at 30 MeV. The carbon-implanted waveguides were found to be thermally stable after annealing at 450 °C A semiempirical formula for predicting the change in the refractive index given the parameters of the implantation process was developed. It is argued that the combination of the basic implantation process with the semiempirical formula can be developed to become a generic method for constructing complex electro-optic circuits with a wave-guided architecture.

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Design methodology of refractive index engineering by implantation of high-energy particles in electro-optic materials

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