TY - JOUR
T1 - Diffusion-controlled reactions of molecular oxygen on porous silica glass
T2 - Coverage dependence of reaction and diffusion rates and evidence for surface heterogeneity
AU - Katz, Ohad
AU - Samuel, Joshua
AU - Avnir, David
AU - Ottolenghi, Michael
PY - 1995
Y1 - 1995
N2 - At relatively low temperatures (T ≤ 130 K) and low coverages the bimolecular, fluorescence quenching, reaction of Ru(bpy)32+ by molecular oxygen on porous silica surfaces is essentially Langmuir-Hinshelwood (LH) as well as diffusion controlled. We have studied the reaction on controlled porous silica glass, with an average size of 95 Å (CPG-75), over the 80-253 K temperature range, varying the degree of O2 coverage. An analysis of the second-order quenching rate constants was carried out based on the classical expressions for diffusion-influenced and diffusion-controlled reactions. As the temperature is increased above ̊130 K, the reaction turns from diffusion-controlled to diffusion-influenced, with substantial contributions from both diffusion and activation terms. Above 160-190 K (at high coverages) the mechanism becomes substantially Eley-Rideal (target annihilation) in nature, preventing the separation of the LH component from the overall rate constant. The rate constants in the predominantly diffusion-controlled range (75-125 K, at low coverages) were analyzed using the two-dimensional (Smoluchowski-type) diffusion model of Freeman and Doll. The treatment leads to the determination of the diffusion coefficient (D) of O2 adsorbed on the porous surface. The diffusion-controlled rate constants and the corresponding diffusion coefficients are found to be markedly affected by the degree of O2 surface coverage. This behavior is accompanied by an analogous coverage effect on the O2 heat of adsorption (Q). The findings are interpreted in terms of the heterogeneity of adsorption sites which leads to the preferential occupation of high Q and, consequently, low D locations. We therefore demonstrate that the mechanism of diffusion-influenced LH reactions on amorphous solid-gas interfaces may be tuned by both temperature and degree of surface coverage.
AB - At relatively low temperatures (T ≤ 130 K) and low coverages the bimolecular, fluorescence quenching, reaction of Ru(bpy)32+ by molecular oxygen on porous silica surfaces is essentially Langmuir-Hinshelwood (LH) as well as diffusion controlled. We have studied the reaction on controlled porous silica glass, with an average size of 95 Å (CPG-75), over the 80-253 K temperature range, varying the degree of O2 coverage. An analysis of the second-order quenching rate constants was carried out based on the classical expressions for diffusion-influenced and diffusion-controlled reactions. As the temperature is increased above ̊130 K, the reaction turns from diffusion-controlled to diffusion-influenced, with substantial contributions from both diffusion and activation terms. Above 160-190 K (at high coverages) the mechanism becomes substantially Eley-Rideal (target annihilation) in nature, preventing the separation of the LH component from the overall rate constant. The rate constants in the predominantly diffusion-controlled range (75-125 K, at low coverages) were analyzed using the two-dimensional (Smoluchowski-type) diffusion model of Freeman and Doll. The treatment leads to the determination of the diffusion coefficient (D) of O2 adsorbed on the porous surface. The diffusion-controlled rate constants and the corresponding diffusion coefficients are found to be markedly affected by the degree of O2 surface coverage. This behavior is accompanied by an analogous coverage effect on the O2 heat of adsorption (Q). The findings are interpreted in terms of the heterogeneity of adsorption sites which leads to the preferential occupation of high Q and, consequently, low D locations. We therefore demonstrate that the mechanism of diffusion-influenced LH reactions on amorphous solid-gas interfaces may be tuned by both temperature and degree of surface coverage.
UR - http://www.scopus.com/inward/record.url?scp=0001169755&partnerID=8YFLogxK
U2 - 10.1021/j100040a045
DO - 10.1021/j100040a045
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AN - SCOPUS:0001169755
SN - 0022-3654
VL - 99
SP - 14893
EP - 14902
JO - Journal of Physical Chemistry
JF - Journal of Physical Chemistry
IS - 40
ER -