Direct atomic structure determination of epitaxially grown films: Gd2O3 on GaAs(100)

M. Sowwan*, Y. Yacoby, J. Pitney, R. MacHarrie, M. Hong, J. Cross, D. A. Walko, R. Clarke, R. Pindak, E. A. Stern

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

51 Scopus citations

Abstract

We have used coherent bragg rod analysis (COBRA) to investigate the atomic structure of an epitaxial Gd2O3 film grown on a (100) GaAs substrate. COBRA is a method to directly obtain the structure of systems periodic in two dimensions by determining the complex scattering factors along the substrate-defined Bragg rods. The system electron density and atomic structure are obtained by Fourier transforming the complex scattering factors into real space. The results show that the stacking order of the Gd2O3 film layers is different from that of cubic bulk Gd2O3 and resembles the stacking order of Ga and As layers in GaAs. Furthermore, in the first few Gd2O3 layers, Gd atoms are displaced to positions right above the Ga and As positions in the substrate, and they relax towards bulk Gd2O3 positions with increasing distance from the interface.

Original languageEnglish
Article number205311
Pages (from-to)2053111-20531112
Number of pages18478002
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume66
Issue number20
StatePublished - 15 Nov 2002

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