Directed self-assembly of block copolymer-based nanocomposites in thin films

E. Michman, R. Shenhar*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


Exploiting the full potential of metal and semiconductor nanoparticles for advanced nanotechnological applications requires their organization into predefined structures with high orientational control. Nanofabrication approaches that combine high resolution lithography and self-assembly afford the advantages of accurate placement, compositional diversity, and reduced production costs. This review concentrates on the creation of organized nanoparticle superstructures assisted by recent developments in the directed self-assembly of block copolymers, and delineates possible applications.

Original languageAmerican English
Pages (from-to)613-622
Number of pages10
JournalPolymers for Advanced Technologies
Issue number5
StatePublished - May 2017

Bibliographical note

Publisher Copyright:
Copyright © 2016 John Wiley & Sons, Ltd.


  • block copolymers
  • directed self-assembly
  • lithography
  • nanoparticles


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