Electronic transport in Si-SiO2 nanocomposite films

M. L. Ciurea*, V. S. Teodorescu, V. Iancu, I. Balberg

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

26 Scopus citations

Abstract

We report experimental investigations and modeling of the electronic transport in Si-SiO2 nanocomposite films. The current-voltage characteristics measured at room temperature are interpreted as due to high field-assisted tunneling. The activation energies from the current-temperature curves are given by the energy separations between quantum confinement electronic states, determined from a quantum well model. Consequently, the calculated mean diameter of a nanodot (5.2 nm) is in good agreement with the microstructure data (5 nm). Also, the potential barrier between nanocrystalline Si and amorphous SiO2, previously obtained for nanocrystalline oxidized porous Si (2.2 eV), is confirmed.

Original languageEnglish
Pages (from-to)225-228
Number of pages4
JournalChemical Physics Letters
Volume423
Issue number1-3
DOIs
StatePublished - 20 May 2006

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