Excitation frequency-dependent raman scattering in a-SiC: H alloys

G. Morell, R. S. Katiyar, S. Z. Weisz, I. Balberg

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

We have carried out a comprehensive Raman scattering study of a-Si, XCX:H alloys using three laser excitations 458, 514, and 581 nm The alloys studied were prepared with and without H, dilution, had carbon concentrations, x, between 7 and 20 at %, and Tauc optical gaps in the range of 1.8 ≤ Eg ≤ 2.2 eV. The results obtained explain the previous conflicting reports in the literature regarding the Si network disorder and indicate that in the Sirich compositions, chemical clustering takes place with increasing carbon content.

Original languageEnglish
Title of host publicationAmorphous Silicon Technology - 1994
Pages607-612
Number of pages6
StatePublished - 1994
Event1994 MRS Spring Meeting - San Francisco, CA, United States
Duration: 4 Apr 19948 Apr 1994

Publication series

NameMaterials Research Society Symposium Proceedings
Volume336
ISSN (Print)0272-9172

Conference

Conference1994 MRS Spring Meeting
Country/TerritoryUnited States
CitySan Francisco, CA
Period4/04/948/04/94

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