Abstract
Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.
Original language | English |
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Pages (from-to) | 301-304 |
Number of pages | 4 |
Journal | Optical Materials |
Volume | 26 |
Issue number | 3 |
DOIs | |
State | Published - Aug 2004 |
Externally published | Yes |
Bibliographical note
Funding Information:This work was partially supported by the Israel Ministry of Science.
Keywords
- Chalcogenide glassy films
- Interference laser lithography
- Photonic crystals
- Spectra of refractive index