Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography

A. Arsh; M. Klebanov; V. Lyubin; L. Shapiro; A. Feigel; M. Veinger; B. Sfez

doi:10.1016/j.optmat.2003.12.013

Glassy mAs₂S₃·nAs₂Se₃ photoresist films for interference laser lithography

A. Arsh
, M. Klebanov
, V. Lyubin^*
, L. Shapiro
, A. Feigel
, M. Veinger
, B. Sfez

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

30 Scopus citations

Abstract

Spectra of refractive index and selective dissolution of several glassy mAs₂S₃·nAs₂Se₃ films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar⁺-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.

Original language	English
Pages (from-to)	301-304
Number of pages	4
Journal	Optical Materials
Volume	26
Issue number	3
DOIs	https://doi.org/10.1016/j.optmat.2003.12.013
State	Published - Aug 2004
Externally published	Yes

Bibliographical note

Funding Information:
This work was partially supported by the Israel Ministry of Science.

Keywords

Chalcogenide glassy films
Interference laser lithography
Photonic crystals
Spectra of refractive index

Access to Document

10.1016/j.optmat.2003.12.013

Cite this

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title = "Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography",

abstract = "Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.",

keywords = "Chalcogenide glassy films, Interference laser lithography, Photonic crystals, Spectra of refractive index",

author = "A. Arsh and M. Klebanov and V. Lyubin and L. Shapiro and A. Feigel and M. Veinger and B. Sfez",

note = "Funding Information: This work was partially supported by the Israel Ministry of Science.",

year = "2004",

month = aug,

doi = "10.1016/j.optmat.2003.12.013",

language = "אנגלית",

volume = "26",

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journal = "Optical Materials",

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T1 - Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography

AU - Arsh, A.

AU - Klebanov, M.

AU - Lyubin, V.

AU - Shapiro, L.

AU - Feigel, A.

AU - Veinger, M.

AU - Sfez, B.

N1 - Funding Information: This work was partially supported by the Israel Ministry of Science.

PY - 2004/8

Y1 - 2004/8

N2 - Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.

AB - Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.

KW - Chalcogenide glassy films

KW - Interference laser lithography

KW - Photonic crystals

KW - Spectra of refractive index

UR - https://www.scopus.com/pages/publications/3042719121

U2 - 10.1016/j.optmat.2003.12.013

DO - 10.1016/j.optmat.2003.12.013

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JO - Optical Materials

JF - Optical Materials

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