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Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography

  • A. Arsh
  • , M. Klebanov
  • , V. Lyubin*
  • , L. Shapiro
  • , A. Feigel
  • , M. Veinger
  • , B. Sfez
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

31 Scopus citations

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Material Science