Gold nanoclusters deposited on silica via water as a buffer layer: Carbon monoxide-infrared reflection absorption spectroscopy and temperature programmed desorption characterization

Matthew Lundwall*, Elad Gross, Micha Asscher, D. Wayne Goodman

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The adsorption properties of carbon monoxide (CO) on gold nanoclusters grown through a buffer-layer-assisted-growth (BLAG) mechanism has been studied with infrared reflection absorption spectroscopy (IRAS) and temperature programmed desorption (TPD). The growth methodology consists of evaporation of gold atoms on top of an amorphous-solid-water covered SiO2 substrate at 100K in ultra high vacuum. A subsequent anneal to 300K desorbs the water molecules, resulting in nanoclusters having a higher aspect ratio than nanoclusters deposited in the absence of the water buffer layer. IRAS shows the CO stretch frequency with and without the buffer layer is essentially identical (2106 ± 2 cm-1). Moreover, the CO stretch frequency was independent of the BLAG cluster size (2 - 10 nm). TPD measurements indicate the interaction of CO with BLAG clusters is weaker than with directly deposited clusters as evidenced by a lower desorption temperature (170 - 190 K for BLAG vs. 230-240 K without). The high temperature tail of the TPD profiles above 200K is assigned to under-coordinated Au atoms that lie at the perimeter of the cluster and interact directly with the SiO2 substrate.

Original languageAmerican English
Title of host publicationAmerican Chemical Society - 237th National Meeting and Exposition, ACS 2009, Abstracts of Scientific Papers
StatePublished - 2009
Event237th National Meeting and Exposition of the American Chemical Society, ACS 2009 - Salt Lake City, UT, United States
Duration: 22 Mar 200926 Mar 2009

Publication series

NameACS National Meeting Book of Abstracts
ISSN (Print)0065-7727

Conference

Conference237th National Meeting and Exposition of the American Chemical Society, ACS 2009
Country/TerritoryUnited States
CitySalt Lake City, UT
Period22/03/0926/03/09

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