High Resolution Deep UV Laser Mask Repair Based on Near-Field Optical Technology

K. Lieberman*, H. Terkel, M. Rudman, A. Ignatov, A. Lewis

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

In this paper we have described the development of an ultra-high resolution laser mask repair system. The revolutionary near-field optical technology provides significant advantages both in resolution and in selectivity of the repair process. The subwavelength, high energy laser beams can ablate chrome films with I 00 nm resolution without damaging the underlying quartz. On-line AFM imaging provides 20 nm resolution defect review and allows for automated image reconstruction. While the present system is directed solely at opaque defect repair, the near-field technique is also applicable to photolitic deposition forClear defect repair. Direct ablation of quartz substrates has also been demonstrated and the preliminary data indicates that the technology holds significant promise for repair of phase shift masks.

Original languageEnglish
Pages (from-to)481-488
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2793
DOIs
StatePublished - 24 Jul 1996
EventSymposium on Photomask and X-Ray Mask Technology III 1996 - Kawasaki City, Japan
Duration: 18 Apr 199619 Apr 1996

Bibliographical note

Publisher Copyright:
© 1996 Proceedings of SPIE - The International Society for Optical Engineering. All rights reserved.

Fingerprint

Dive into the research topics of 'High Resolution Deep UV Laser Mask Repair Based on Near-Field Optical Technology'. Together they form a unique fingerprint.

Cite this