High-spatial resolution resistivity mapping of large-area YBCO films by a near-field millimeter-wave microscope

Michael Golosovsky*, Alexander Galkin, Dan Davidov

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

39 Scopus citations

Abstract

We demonstrate a new millimeter-wave technique for the resistivity mapping of large-area conducting films, namely, a near-field resistivity microscope. The microscope is based (in the idea that electromagnetic waves are transmitted through a narrow resonant slit with high efficiency. By scanning this slit at fixed height above an inhomogeneous conducting surface and measuring the intensity and phase of the reflected wave, the resistivity of this surface may be determined with a 10-100 μm spatial resolution using 80-GHz radiation. Using this technique, we map normal-sate resistivity of 1 in X 1 in YBCO films at ambient temperature. In some films we find inhomogeneities of the normal-state sheet resistance of the order of 10%-20%.

Original languageEnglish
Pages (from-to)1390-1392
Number of pages3
JournalIEEE Transactions on Microwave Theory and Techniques
Volume44
Issue number7 PART 2
DOIs
StatePublished - 1996

Fingerprint

Dive into the research topics of 'High-spatial resolution resistivity mapping of large-area YBCO films by a near-field millimeter-wave microscope'. Together they form a unique fingerprint.

Cite this