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III-V compound semiconductor reactive ion etching in chlorine and methane containing mixtures
- A. E. Dulkin*
- , S. A. Moshkalyov
- , V. Z. Pyataev
- , A. S. Smirnov
- , K. S. Frolov
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
6
Scopus
citations