Fingerprint
Dive into the research topics of 'III-V compound semiconductor reactive ion etching in chlorine and methane containing mixtures'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
III-V compound semiconductor reactive ion etching in chlorine and methane containing mixtures
A. E. Dulkin*, S. A. Moshkalyov, V. Z. Pyataev, A. S. Smirnov, K. S. Frolov
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
6
Scopus
citations