In situ spectroscopic ellipsometry monitoring of multilayer growth dynamics via molecular layer epitaxy

Vladimir Burtman, Yuval Ofir, Shlomo Yitzchaik*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

Real time monitoring of organic monolayer self-assembly by molecular layer epitaxy (MLE) processes was studied by in situ spectroscopic ellipsometry techniques. For the MLE of imide-based organic heterostructures using chemisorption of 3,4,7,8-naphthalenetetracarboxylic dianhydride (NTCDA) and 1,6-diamino-n-hexane (DAH) on prefunctionalized surfaces, in situ ellipsometry reveals that the reaction kinetics can be best fitted to an S-shaped deposition curve with saturated coverage of about 20 min by the Langmuir-Hinshelwood model, with a slow initial phase, followed by a faster second phase. The rate of deposition at each moment is proportional to the number of empty sites multiplied by the number of occupied sites. Calculated deposition rate constants for every pulse are kT = 5.6 × 10-5 s-1 for first deposition of NTCDA on a template (T-layer), decreasing to kA = 1.5 × 10-5 s-1 for NTCDA and to kB = 7.2 × 10-6 s-1 for DAH assembly pulses correspondingly. A modified Rudzinski-Aharoni kinetic model for adsorption that correlates adsorption energy with valid numbers of reactive sites was used to estimate an equilibrium surface absorption energy of 16 kcal for a NTCDA layer and 29 kcal for a DAH layer.

Original languageAmerican English
Pages (from-to)2137-2142
Number of pages6
JournalLangmuir
Volume17
Issue number7
DOIs
StatePublished - 3 Apr 2001

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