Abstract
In this paper we show that the degree of order of the Si network in a-Si:H is increasing with two length scales from the surface into the bulk. The major manifestation of the disorder is the variation in the Si-Si bond-stretching rather than the variation in the width of the dihedral angle distribution. The results are interpreted in terms of the decrease of the hydrogen concentration from the free surface into the bulk.
| Original language | English |
|---|---|
| Title of host publication | Amorphous Silicon Technology |
| Publisher | Publ by Materials Research Society |
| Pages | 321-326 |
| Number of pages | 6 |
| ISBN (Print) | 155899193X, 9781558991934 |
| DOIs | |
| State | Published - 1993 |
| Externally published | Yes |
| Event | Proceedings of the MRS Spring Meeting - San Francisco, CA, USA Duration: 13 Apr 1993 → 16 Apr 1993 |
Publication series
| Name | Materials Research Society Symposium Proceedings |
|---|---|
| Volume | 297 |
| ISSN (Print) | 0272-9172 |
Conference
| Conference | Proceedings of the MRS Spring Meeting |
|---|---|
| City | San Francisco, CA, USA |
| Period | 13/04/93 → 16/04/93 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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