Interface characterization by dual neutron activation

Y. Ashkenazy, E. Glikman, I. Kelson*, P. E. Haustein

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

A new method of characterizing sharp interfaces is presented. The method utilizes the structural modification of the interface caused by thermal-neutron-induced recoil. Dual neutron activations, coupled with chemical etching, are used to correlate the initial and the modified material distributions across the interface. The nuclear and the radiochemical aspects of the method are tested for samples of polycrystalline gold sputtered on amorphous silicon dioxide.

Original languageAmerican English
Pages (from-to)248-253
Number of pages6
JournalSurface Science
Volume388
Issue number1-3
DOIs
StatePublished - 23 Oct 1997
Externally publishedYes

Keywords

  • Atom-solid interactions
  • Crystalline-amorphous interfaces
  • Gold
  • Interface states
  • Radioactive trace methods
  • Silicon oxides

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