Interface characterization by dual neutron activation

Y. Ashkenazy; E. Glikman; I. Kelson; P. E. Haustein

doi:10.1016/S0039-6028(97)00408-1

Interface characterization by dual neutron activation

Y. Ashkenazy, E. Glikman, I. Kelson^*, P. E. Haustein

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

A new method of characterizing sharp interfaces is presented. The method utilizes the structural modification of the interface caused by thermal-neutron-induced recoil. Dual neutron activations, coupled with chemical etching, are used to correlate the initial and the modified material distributions across the interface. The nuclear and the radiochemical aspects of the method are tested for samples of polycrystalline gold sputtered on amorphous silicon dioxide.

Original language	English
Pages (from-to)	248-253
Number of pages	6
Journal	Surface Science
Volume	388
Issue number	1-3
DOIs	https://doi.org/10.1016/S0039-6028(97)00408-1
State	Published - 23 Oct 1997
Externally published	Yes

Keywords

Atom-solid interactions
Crystalline-amorphous interfaces
Gold
Interface states
Radioactive trace methods
Silicon oxides

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10.1016/S0039-6028(97)00408-1

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abstract = "A new method of characterizing sharp interfaces is presented. The method utilizes the structural modification of the interface caused by thermal-neutron-induced recoil. Dual neutron activations, coupled with chemical etching, are used to correlate the initial and the modified material distributions across the interface. The nuclear and the radiochemical aspects of the method are tested for samples of polycrystalline gold sputtered on amorphous silicon dioxide.",

keywords = "Atom-solid interactions, Crystalline-amorphous interfaces, Gold, Interface states, Radioactive trace methods, Silicon oxides",

author = "Y. Ashkenazy and E. Glikman and I. Kelson and Haustein, {P. E.}",

year = "1997",

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AU - Haustein, P. E.

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N2 - A new method of characterizing sharp interfaces is presented. The method utilizes the structural modification of the interface caused by thermal-neutron-induced recoil. Dual neutron activations, coupled with chemical etching, are used to correlate the initial and the modified material distributions across the interface. The nuclear and the radiochemical aspects of the method are tested for samples of polycrystalline gold sputtered on amorphous silicon dioxide.

AB - A new method of characterizing sharp interfaces is presented. The method utilizes the structural modification of the interface caused by thermal-neutron-induced recoil. Dual neutron activations, coupled with chemical etching, are used to correlate the initial and the modified material distributions across the interface. The nuclear and the radiochemical aspects of the method are tested for samples of polycrystalline gold sputtered on amorphous silicon dioxide.

KW - Atom-solid interactions

KW - Crystalline-amorphous interfaces

KW - Gold

KW - Interface states

KW - Radioactive trace methods

KW - Silicon oxides

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JO - Surface Science

JF - Surface Science

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Interface characterization by dual neutron activation

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Keywords

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