Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

Har'El Ilan; Sagi Frishman; Aharon J. Agranat

doi:10.1063/1.4757128

Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

Har'El Ilan^*, Sagi Frishman, Aharon J. Agranat

^*Corresponding author for this work

Department of Applied Physics

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm ² within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.

Original language	English
Article number	141111
Journal	Applied Physics Letters
Volume	101
Issue number	14
DOIs	https://doi.org/10.1063/1.4757128
State	Published - 1 Oct 2012

Bibliographical note

Funding Information:
We acknowledge the support of the Eshkol Fellowships Foundation, Grant No. 3-6435, of the Israeli Ministry of Science.

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abstract = "The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm 2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.",

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AU - Ilan, Har'El

AU - Frishman, Sagi

AU - Agranat, Aharon J.

N1 - Funding Information: We acknowledge the support of the Eshkol Fellowships Foundation, Grant No. 3-6435, of the Israeli Ministry of Science.

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Y1 - 2012/10/1

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AB - The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm 2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.

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Investigation of the conduction in an implanted layer of protons in a potassium lithium tantalate niobate substrate

Abstract

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