The electrical conductivity in the amorphous layer formed by the implantation of protons at 1.15 MeV with fluence of 1.1 × 10 17 ions/cm 2 within the depth of potassium lithium tantalate niobate is investigated by four probes and Hall effect measurements. It is shown that the conductivity originates from electrons that are induced by Hydrogen donors that reside in a band structure 0.22 eV below the conduction band. It is claimed that this phenomenon enables the construction of conductive structures with submicron features within the depth of the substrate that can be used as embedded electrodes in electrooptical devices integrated in this substrate.
Bibliographical noteFunding Information:
We acknowledge the support of the Eshkol Fellowships Foundation, Grant No. 3-6435, of the Israeli Ministry of Science.