Low cost, nanometer scale nanoimprinting - Application to organic solar cells optimization

Eran Avnon; Nir Yaacobi-Gross; Elina Ploshnik; Roy Shenhar; Nir Tessler

doi:10.1016/j.orgel.2011.03.041

Low cost, nanometer scale nanoimprinting - Application to organic solar cells optimization

Eran Avnon, Nir Yaacobi-Gross, Elina Ploshnik, Roy Shenhar, Nir Tessler^*

^*Corresponding author for this work

Institute of Chemistry

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

We show that nanoimprinting can be robust and reliable enough to be compatible with device optimization procedure. This is enabled by a method for producing nanoimprint master stamps using block copolymer lithography. This method is not only robust and low cost but it also allows patterning with nanometer size features over centimeter scale area. The large number of stamps easily produced in parallel are used to fabricate organic solar cells with controlled interpenetrating heterojunction. The power conversion efficiency is shown to increase with the pattern depth reaching a two fold increase for only ∼35 nm deep pattern.

Original language	English
Pages (from-to)	1241-1246
Number of pages	6
Journal	Organic Electronics
Volume	12
Issue number	7
DOIs	https://doi.org/10.1016/j.orgel.2011.03.041
State	Published - Jul 2011

Bibliographical note

Funding Information:
We acknowledge the support of the Ollendorff Minerva Center , the NanoSci-ERA program , and the Russell Berrie Nanotechnology Institute at the Technion . E.A. acknowledges the support of the Israeli ministry of science.

Keywords

Block copolymer lithography
Nanoimprinting
Organic photovoltaics
Organic solar cells

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1016/j.orgel.2011.03.041

Cite this

@article{b7eec90a4f754c538d3f70c86a8aa4f2,

title = "Low cost, nanometer scale nanoimprinting - Application to organic solar cells optimization",

abstract = "We show that nanoimprinting can be robust and reliable enough to be compatible with device optimization procedure. This is enabled by a method for producing nanoimprint master stamps using block copolymer lithography. This method is not only robust and low cost but it also allows patterning with nanometer size features over centimeter scale area. The large number of stamps easily produced in parallel are used to fabricate organic solar cells with controlled interpenetrating heterojunction. The power conversion efficiency is shown to increase with the pattern depth reaching a two fold increase for only ∼35 nm deep pattern.",

keywords = "Block copolymer lithography, Nanoimprinting, Organic photovoltaics, Organic solar cells",

author = "Eran Avnon and Nir Yaacobi-Gross and Elina Ploshnik and Roy Shenhar and Nir Tessler",

note = "Funding Information: We acknowledge the support of the Ollendorff Minerva Center , the NanoSci-ERA program , and the Russell Berrie Nanotechnology Institute at the Technion . E.A. acknowledges the support of the Israeli ministry of science. ",

year = "2011",

month = jul,

doi = "10.1016/j.orgel.2011.03.041",

language = "אנגלית",

volume = "12",

pages = "1241--1246",

journal = "Organic Electronics",

issn = "1566-1199",

publisher = "Elsevier B.V.",

number = "7",

}

TY - JOUR

T1 - Low cost, nanometer scale nanoimprinting - Application to organic solar cells optimization

AU - Avnon, Eran

AU - Yaacobi-Gross, Nir

AU - Ploshnik, Elina

AU - Shenhar, Roy

AU - Tessler, Nir

N1 - Funding Information: We acknowledge the support of the Ollendorff Minerva Center , the NanoSci-ERA program , and the Russell Berrie Nanotechnology Institute at the Technion . E.A. acknowledges the support of the Israeli ministry of science.

PY - 2011/7

Y1 - 2011/7

N2 - We show that nanoimprinting can be robust and reliable enough to be compatible with device optimization procedure. This is enabled by a method for producing nanoimprint master stamps using block copolymer lithography. This method is not only robust and low cost but it also allows patterning with nanometer size features over centimeter scale area. The large number of stamps easily produced in parallel are used to fabricate organic solar cells with controlled interpenetrating heterojunction. The power conversion efficiency is shown to increase with the pattern depth reaching a two fold increase for only ∼35 nm deep pattern.

AB - We show that nanoimprinting can be robust and reliable enough to be compatible with device optimization procedure. This is enabled by a method for producing nanoimprint master stamps using block copolymer lithography. This method is not only robust and low cost but it also allows patterning with nanometer size features over centimeter scale area. The large number of stamps easily produced in parallel are used to fabricate organic solar cells with controlled interpenetrating heterojunction. The power conversion efficiency is shown to increase with the pattern depth reaching a two fold increase for only ∼35 nm deep pattern.

KW - Block copolymer lithography

KW - Nanoimprinting

KW - Organic photovoltaics

KW - Organic solar cells

UR - http://www.scopus.com/inward/record.url?scp=79955552160&partnerID=8YFLogxK

U2 - 10.1016/j.orgel.2011.03.041

DO - 10.1016/j.orgel.2011.03.041

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.article???

AN - SCOPUS:79955552160

SN - 1566-1199

VL - 12

SP - 1241

EP - 1246

JO - Organic Electronics

JF - Organic Electronics

IS - 7

ER -

Low cost, nanometer scale nanoimprinting - Application to organic solar cells optimization

Abstract

Bibliographical note

Keywords

UN SDGs

Access to Document

Other files and links

Fingerprint

Cite this