We show that nanoimprinting can be robust and reliable enough to be compatible with device optimization procedure. This is enabled by a method for producing nanoimprint master stamps using block copolymer lithography. This method is not only robust and low cost but it also allows patterning with nanometer size features over centimeter scale area. The large number of stamps easily produced in parallel are used to fabricate organic solar cells with controlled interpenetrating heterojunction. The power conversion efficiency is shown to increase with the pattern depth reaching a two fold increase for only ∼35 nm deep pattern.
Bibliographical noteFunding Information:
We acknowledge the support of the Ollendorff Minerva Center , the NanoSci-ERA program , and the Russell Berrie Nanotechnology Institute at the Technion . E.A. acknowledges the support of the Israeli ministry of science.
- Block copolymer lithography
- Organic photovoltaics
- Organic solar cells