Low pressure growth and properties of CrO2 on Al2O3

Lina Ben-dor*, Yehoshua Shimony

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

Thin films of CrO2 on single crystal plates of Al2O3 were grown by a vapor deposition process in sealed silica tubes. CrO2Cl2 was formed from CrCl3 . 6H2O and CrO3 in one zone at 250 °C and decomposed to yield CrO2 in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.

Original languageEnglish
Pages (from-to)175-178
Number of pages4
JournalJournal of Crystal Growth
Volume24-25
Issue numberC
DOIs
StatePublished - Oct 1974

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