Abstract
Thin films of CrO2 on single crystal plates of Al2O3 were grown by a vapor deposition process in sealed silica tubes. CrO2Cl2 was formed from CrCl3 . 6H2O and CrO3 in one zone at 250 °C and decomposed to yield CrO2 in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.
Original language | English |
---|---|
Pages (from-to) | 175-178 |
Number of pages | 4 |
Journal | Journal of Crystal Growth |
Volume | 24-25 |
Issue number | C |
DOIs | |
State | Published - Oct 1974 |