Low pressure growth and properties of CrO2 on Al2O3

Lina Ben-dor; Yehoshua Shimony

doi:10.1016/0022-0248(74)90299-1

Low pressure growth and properties of CrO₂ on Al₂O₃

Lina Ben-dor^*
, Yehoshua Shimony

^*Corresponding author for this work

Institute of Chemistry

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

Thin films of CrO₂ on single crystal plates of Al₂O₃ were grown by a vapor deposition process in sealed silica tubes. CrO₂Cl₂ was formed from CrCl₃ . 6H₂O and CrO₃ in one zone at 250 °C and decomposed to yield CrO₂ in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.

Original language	English
Pages (from-to)	175-178
Number of pages	4
Journal	Journal of Crystal Growth
Volume	24-25
Issue number	C
DOIs	https://doi.org/10.1016/0022-0248(74)90299-1
State	Published - Oct 1974

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title = "Low pressure growth and properties of CrO2 on Al2O3",

abstract = "Thin films of CrO2 on single crystal plates of Al2O3 were grown by a vapor deposition process in sealed silica tubes. CrO2Cl2 was formed from CrCl3 . 6H2O and CrO3 in one zone at 250 °C and decomposed to yield CrO2 in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.",

author = "Lina Ben-dor and Yehoshua Shimony",

year = "1974",

month = oct,

doi = "10.1016/0022-0248(74)90299-1",

language = "אנגלית",

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journal = "Journal of Crystal Growth",

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T1 - Low pressure growth and properties of CrO2 on Al2O3

AU - Ben-dor, Lina

AU - Shimony, Yehoshua

PY - 1974/10

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N2 - Thin films of CrO2 on single crystal plates of Al2O3 were grown by a vapor deposition process in sealed silica tubes. CrO2Cl2 was formed from CrCl3 . 6H2O and CrO3 in one zone at 250 °C and decomposed to yield CrO2 in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.

AB - Thin films of CrO2 on single crystal plates of Al2O3 were grown by a vapor deposition process in sealed silica tubes. CrO2Cl2 was formed from CrCl3 . 6H2O and CrO3 in one zone at 250 °C and decomposed to yield CrO2 in a second zone at 380 °C. The overall pressure was less than 3 atm. The films were characterized by optical and electron microscopy, by X-ray analysis, by magnetic behavior and optical absorption.

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JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - C

ER -

Low pressure growth and properties of CrO₂ on Al₂O₃

Abstract

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