Low propagation loss in GaN/AlGaN-based ridge waveguides

Ohad Westreich*, Mordechai Katz, Yossi Paltiel, Orna Ternyak, Noam Sicron

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

We report the fabrication and characterization of GaN/AlGaN ridge waveguides (WG). The "ridge" design was chosen to ensure low propagation loss. The fabrication process included four steps that could be easily regulated. GaN and AlGaN cladding layers were grown on a sapphire substrate by MOCVD. Shallow ridges were formed in the top cladding layer using ICP-RIE. After etching, samples were diced and WG facets were formed by polishing the samples opposite sides. The propagation loss at 1.56 μm was evaluated by measuring Fabry-Perot resonances from end-facet reflections. Losses as low as 1 dB/cm were measured for single mode WGs. Such low-loss two-dimensional WG could advance the use of GaN in integrated optoelectronics wave guiding components. Schematic illustration of GaN ridge WG structure (left) and a SEM image of a 10 μm wide ridge WG structure (right).

Original languageAmerican English
Pages (from-to)1043-1048
Number of pages6
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume212
Issue number5
DOIs
StatePublished - 1 May 2015

Bibliographical note

Publisher Copyright:
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords

  • AlGaN
  • Fabry-Perot resonances
  • GaN
  • photonics
  • propagation losses
  • waveguides

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