Measurement of HCl electron attachment in relation to XeCl laser kinetics

D. Kligler*, Z. Rozenberg, M. Rokni

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

The electron attachment rate constant of HCl is measured in e-beam-excited mixtures of N2/HCl and Ar/H2/HCl, by observing the electron current decay after termination of an e-beam pulse. The possible enhancement of attachment due to vibrational excitation of HCl under e-beam pumping is studied, by performing measurements with e-beam currents differing by a factor of 30. The consequences of the results for XeCl laser kinetics are discussed.

Original languageEnglish
Pages (from-to)319-321
Number of pages3
JournalApplied Physics Letters
Volume39
Issue number4
DOIs
StatePublished - 1981

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