Measurement of HCl electron attachment in relation to XeCl laser kinetics

D. Kligler; Z. Rozenberg; M. Rokni

doi:10.1063/1.92706

Measurement of HCl electron attachment in relation to XeCl laser kinetics

D. Kligler^*
, Z. Rozenberg
, M. Rokni

^*Corresponding author for this work

Racah Institute of Physics

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

The electron attachment rate constant of HCl is measured in e-beam-excited mixtures of N₂/HCl and Ar/H₂/HCl, by observing the electron current decay after termination of an e-beam pulse. The possible enhancement of attachment due to vibrational excitation of HCl under e-beam pumping is studied, by performing measurements with e-beam currents differing by a factor of 30. The consequences of the results for XeCl laser kinetics are discussed.

Original language	English
Pages (from-to)	319-321
Number of pages	3
Journal	Applied Physics Letters
Volume	39
Issue number	4
DOIs	https://doi.org/10.1063/1.92706
State	Published - 1981

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@article{a36b049c1e3a41058deb801a20771935,

title = "Measurement of HCl electron attachment in relation to XeCl laser kinetics",

abstract = "The electron attachment rate constant of HCl is measured in e-beam-excited mixtures of N2/HCl and Ar/H2/HCl, by observing the electron current decay after termination of an e-beam pulse. The possible enhancement of attachment due to vibrational excitation of HCl under e-beam pumping is studied, by performing measurements with e-beam currents differing by a factor of 30. The consequences of the results for XeCl laser kinetics are discussed.",

author = "D. Kligler and Z. Rozenberg and M. Rokni",

year = "1981",

doi = "10.1063/1.92706",

language = "אנגלית",

volume = "39",

pages = "319--321",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "4",

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T1 - Measurement of HCl electron attachment in relation to XeCl laser kinetics

AU - Kligler, D.

AU - Rozenberg, Z.

AU - Rokni, M.

PY - 1981

Y1 - 1981

N2 - The electron attachment rate constant of HCl is measured in e-beam-excited mixtures of N2/HCl and Ar/H2/HCl, by observing the electron current decay after termination of an e-beam pulse. The possible enhancement of attachment due to vibrational excitation of HCl under e-beam pumping is studied, by performing measurements with e-beam currents differing by a factor of 30. The consequences of the results for XeCl laser kinetics are discussed.

AB - The electron attachment rate constant of HCl is measured in e-beam-excited mixtures of N2/HCl and Ar/H2/HCl, by observing the electron current decay after termination of an e-beam pulse. The possible enhancement of attachment due to vibrational excitation of HCl under e-beam pumping is studied, by performing measurements with e-beam currents differing by a factor of 30. The consequences of the results for XeCl laser kinetics are discussed.

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DO - 10.1063/1.92706

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AN - SCOPUS:0040040197

SN - 0003-6951

VL - 39

SP - 319

EP - 321

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 4

ER -

Measurement of HCl electron attachment in relation to XeCl laser kinetics

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