Monolayer contact doping of silicon surfaces and nanowires using organophosphorus compounds

Ori Hazut, Arunava Agarwala, Thangavel Subramani, Sharon Waichman, Roie Yerushalmi

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


Monolayer Contact Doping (MLCD) is a simple method for doping of surfaces and nanostructures1. MLCD results in the formation of highly controlled, ultra shallow and sharp doping profiles at the nanometer scale. In MLCD process the dopant source is a monolayer containing dopant atoms. In this article a detailed procedure for surface doping of silicon substrate as well as silicon nanowires is demonstrated. Phosphorus dopant source was formed using tetraethyl methylenediphosphonate monolayer on a silicon substrate. This monolayer containing substrate was brought to contact with a pristine intrinsic silicon target substrate and annealed while in contact. Sheet resistance of the target substrate was measured using 4 point probe. Intrinsic silicon nanowires were synthesized by chemical vapor deposition (CVD) process using a vapor-liquid-solid (VLS) mechanism; gold nanoparticles were used as catalyst for nanowire growth. The nanowires were suspended in ethanol by mild sonication. This suspension was used to dropcast the nanowires on silicon substrate with a silicon nitride dielectric top layer. These nanowires were doped with phosphorus in similar manner as used for the intrinsic silicon wafer. Standard photolithography process was used to fabricate metal electrodes for the formation of nanowire based field effect transistor (NW-FET). The electrical properties of a representative nanowire device were measured by a semiconductor device analyzer and a probe station.

Original languageAmerican English
JournalJournal of Visualized Experiments
Issue number82
StatePublished - 12 Feb 2013


  • Basic protocol
  • Chemical vapor deposition (CVD)
  • Chemistry
  • Issue 82
  • Monolayer contact doping (MLCD)
  • Nanotechnology
  • Nanowire
  • Silicon substrate


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