Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

Dennis S. Greywall; Chien Shing Pai; Sang Hyun Oh; Chorng Ping Chang; Dan M. Marom; Paul A. Busch; Raymond A. Cirelli; J. Ashley Taylor; Fred P. Klemens; Thomas W. Sorsch; John Eric Bower; Warren Y.C. Lai; Hyongsok T. Soh

doi:10.1109/JMEMS.2003.818068

Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

Dennis S. Greywall^*, Chien Shing Pai, Sang Hyun Oh, Chorng Ping Chang, Dan M. Marom, Paul A. Busch, Raymond A. Cirelli, J. Ashley Taylor, Fred P. Klemens, Thomas W. Sorsch, John Eric Bower, Warren Y.C. Lai, Hyongsok T. Soh

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.

Original language	English
Pages (from-to)	702-707
Number of pages	6
Journal	Journal of Microelectromechanical Systems
Volume	12
Issue number	5
DOIs	https://doi.org/10.1109/JMEMS.2003.818068
State	Published - Oct 2003
Externally published	Yes

Keywords

MEMS
MOEMS
Micromachined structures
Optical telecommunications

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10.1109/JMEMS.2003.818068

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Greywall, D. S., Pai, C. S., Oh, S. H., Chang, C. P., Marom, D. M., Busch, P. A., Cirelli, R. A., Taylor, J. A., Klemens, F. P., Sorsch, T. W., Bower, J. E., Lai, W. Y. C., & Soh, H. T. (2003). Monolithic fringe-field-activated crystalline silicon tilting-mirror devices. Journal of Microelectromechanical Systems, 12(5), 702-707. https://doi.org/10.1109/JMEMS.2003.818068

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abstract = "A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.",

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AU - Pai, Chien Shing

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AU - Marom, Dan M.

AU - Busch, Paul A.

AU - Cirelli, Raymond A.

AU - Taylor, J. Ashley

AU - Klemens, Fred P.

AU - Sorsch, Thomas W.

AU - Bower, John Eric

AU - Lai, Warren Y.C.

AU - Soh, Hyongsok T.

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AB - A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.

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Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

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Keywords

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