Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

Dennis S. Greywall; Chien Shing Pai; Sang Hyun Oh; Chorng Ping Chang; Dan M. Marom; Paul A. Busch; Raymond A. Cirelli; J. Ashley Taylor; Fred P. Klemens; Thomas W. Sorsch; John Eric Bower; Warren Y.C. Lai; Hyongsok T. Soh

doi:10.1109/JMEMS.2003.818068

Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

Dennis S. Greywall^*
, Chien Shing Pai
, Sang Hyun Oh
, Chorng Ping Chang
, Dan M. Marom
, Paul A. Busch
, Raymond A. Cirelli
, J. Ashley Taylor
, Fred P. Klemens
, Thomas W. Sorsch
, John Eric Bower
, Warren Y.C. Lai
, Hyongsok T. Soh

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

33 Scopus citations

Abstract

A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.

Original language	English
Pages (from-to)	702-707
Number of pages	6
Journal	Journal of Microelectromechanical Systems
Volume	12
Issue number	5
DOIs	https://doi.org/10.1109/JMEMS.2003.818068
State	Published - Oct 2003
Externally published	Yes

Keywords

MEMS
MOEMS
Micromachined structures
Optical telecommunications

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10.1109/JMEMS.2003.818068

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Greywall, D. S., Pai, C. S., Oh, S. H., Chang, C. P., Marom, D. M., Busch, P. A., Cirelli, R. A., Taylor, J. A., Klemens, F. P., Sorsch, T. W., Bower, J. E., Lai, W. Y. C., & Soh, H. T. (2003). Monolithic fringe-field-activated crystalline silicon tilting-mirror devices. Journal of Microelectromechanical Systems, 12(5), 702-707. https://doi.org/10.1109/JMEMS.2003.818068

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title = "Monolithic fringe-field-activated crystalline silicon tilting-mirror devices",

abstract = "A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.",

keywords = "MEMS, MOEMS, Micromachined structures, Optical telecommunications",

author = "Greywall, \{Dennis S.\} and Pai, \{Chien Shing\} and Oh, \{Sang Hyun\} and Chang, \{Chorng Ping\} and Marom, \{Dan M.\} and Busch, \{Paul A.\} and Cirelli, \{Raymond A.\} and Taylor, \{J. Ashley\} and Klemens, \{Fred P.\} and Sorsch, \{Thomas W.\} and Bower, \{John Eric\} and Lai, \{Warren Y.C.\} and Soh, \{Hyongsok T.\}",

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doi = "10.1109/JMEMS.2003.818068",

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AU - Greywall, Dennis S.

AU - Pai, Chien Shing

AU - Oh, Sang Hyun

AU - Chang, Chorng Ping

AU - Marom, Dan M.

AU - Busch, Paul A.

AU - Cirelli, Raymond A.

AU - Taylor, J. Ashley

AU - Klemens, Fred P.

AU - Sorsch, Thomas W.

AU - Bower, John Eric

AU - Lai, Warren Y.C.

AU - Soh, Hyongsok T.

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N2 - A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.

AB - A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9° tilt range device array.

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KW - Micromachined structures

KW - Optical telecommunications

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ER -

Monolithic fringe-field-activated crystalline silicon tilting-mirror devices

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Keywords

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