Multi‐sample negative ion source

W. Z. Gelbart, R. R. Johnson, M. Paul, Y. Shahar, R. B. Schubank, F. Cifarelli

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

A cesium sputter, negative ion source was developed and built at Triumf. While designed for accelerator mass spectrometry, it can be applied in any field requiring intensive negative ion beams covering the whole range from hydrogen to uranium. The source features an internal cesium oven and simplified target insulation. A pneumatically actuated target changer contains a 28‐sample wheel but allows manual placing of single samples as well. In initial runs the source produced over 1 μA of 40CaH 3 and.25 μA of 27Al beams. The construction of the source and the operation of the sample changer are discussed in this article.

Original languageEnglish
Pages (from-to)1230-1232
Number of pages3
JournalReview of Scientific Instruments
Volume67
Issue number3
DOIs
StatePublished - Mar 1996
Externally publishedYes

Keywords

  • ANIONS
  • DESIGN
  • ION SOURCES
  • KEV RANGE 01−10
  • MICRO AMP BEAM CURRENTS
  • SAMPLE CHANGERS
  • SPUTTERING
  • TEMPERATURE RANGE 1000−4000 K

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