Nanoparticle assembly by transient topography induced by applying soft lithography to block copolymer films

Meneka Banik, Roy Shenhar*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

We present a simple approach for patterning metal nanoparticles into periodic superstructures on flat films spanning centimeter-square areas. Our approach is based on capillary force lithography, a soft lithography method that is used to impart topography to molten polymer films, and applies it to block copolymer films to obtain substrates featuring both topographic and chemical contrasts that can serve as templates for the selective deposition of nanoparticles. Here we show that flattening the films by exposure to solvent vapour prior to nanoparticle deposition not only retains chemical heterogeneity but also provides access to unique hierarchically-organized nanoparticle superstructures that are unattainable by other methods. Such structures could be useful for optical, sensor, and catalytic applications.

Original languageAmerican English
JournalSoft Matter
DOIs
StateAccepted/In press - 2024

Bibliographical note

Publisher Copyright:
© 2024 The Royal Society of Chemistry.

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