Near-field nanofabrication with pipette guided ArF excimer laser

M. Rudman, A. Shchemelinin, K. Lieberman, A. Lewis

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

A number of distance control methods have been developed which allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 1 00 nm. These feedback technique are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.

Original languageEnglish
Pages (from-to)826-834
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2197
DOIs
StatePublished - 17 May 1994
EventOptical/Laser Microlithography VII 1994 - San Jose, United States
Duration: 27 Feb 19944 Mar 1994

Bibliographical note

Publisher Copyright:
© 1994 SPIE. All rights reserved.

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