Abstract
A number of distance control methods have been developed which allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 1 00 nm. These feedback technique are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.
Original language | English |
---|---|
Pages (from-to) | 826-834 |
Number of pages | 9 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 2197 |
DOIs | |
State | Published - 17 May 1994 |
Event | Optical/Laser Microlithography VII 1994 - San Jose, United States Duration: 27 Feb 1994 → 4 Mar 1994 |
Bibliographical note
Publisher Copyright:© 1994 SPIE. All rights reserved.