Near-field nanofabrication with pipette guided ArF excimer laser

M. Rudman; A. Shchemelinin; K. Lieberman; A. Lewis

doi:10.1117/12.175473

Near-field nanofabrication with pipette guided ArF excimer laser

M. Rudman
, A. Shchemelinin
, K. Lieberman
, A. Lewis

The Institute of Applied Physics

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

A number of distance control methods have been developed which allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 1 00 nm. These feedback technique are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.

Original language	English
Pages (from-to)	826-834
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	2197
DOIs	https://doi.org/10.1117/12.175473
State	Published - 17 May 1994
Event	Optical/Laser Microlithography VII 1994 - San Jose, United States Duration: 27 Feb 1994 → 4 Mar 1994

Bibliographical note

Publisher Copyright:
© 1994 SPIE. All rights reserved.

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@article{5fd6060e900a4c8b80e33772966e0cf8,

title = "Near-field nanofabrication with pipette guided ArF excimer laser",

abstract = "A number of distance control methods have been developed which allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 1 00 nm. These feedback technique are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.",

author = "M. Rudman and A. Shchemelinin and K. Lieberman and A. Lewis",

year = "1994",

month = may,

day = "17",

doi = "10.1117/12.175473",

language = "אנגלית",

volume = "2197",

pages = "826--834",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

}

TY - JOUR

T1 - Near-field nanofabrication with pipette guided ArF excimer laser

AU - Rudman, M.

AU - Shchemelinin, A.

AU - Lieberman, K.

AU - Lewis, A.

PY - 1994/5/17

Y1 - 1994/5/17

N2 - A number of distance control methods have been developed which allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 1 00 nm. These feedback technique are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.

AB - A number of distance control methods have been developed which allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 1 00 nm. These feedback technique are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.

UR - https://www.scopus.com/pages/publications/0345230146

U2 - 10.1117/12.175473

DO - 10.1117/12.175473

M3 - ???researchoutput.researchoutputtypes.contributiontojournal.conferencearticle???

AN - SCOPUS:0345230146

SN - 0277-786X

VL - 2197

SP - 826

EP - 834

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Optical/Laser Microlithography VII 1994

Y2 - 27 February 1994 through 4 March 1994

ER -

Near-field nanofabrication with pipette guided ArF excimer laser

Abstract

Bibliographical note

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