TY - JOUR
T1 - New application of inorganic chalcogenide photoresists in lift-off photolithography
AU - Veinguer, M.
AU - Feigel, A.
AU - Sfez, B.
AU - Klebanov, M.
AU - Lyubin, V.
PY - 2003
Y1 - 2003
N2 - The advantages of inorganic chalcogenide photoresists (ChP) were discussed. ChP films were used as photoresist for lift-off photolithography. The fabrication of gratings in layers of highly refractive As-Se-Te films was also analyzed. ChP were found to have very high resolution, photosensitivity in a wide spectral range, and they could be used on both planar and nonplanar substrates.
AB - The advantages of inorganic chalcogenide photoresists (ChP) were discussed. ChP films were used as photoresist for lift-off photolithography. The fabrication of gratings in layers of highly refractive As-Se-Te films was also analyzed. ChP were found to have very high resolution, photosensitivity in a wide spectral range, and they could be used on both planar and nonplanar substrates.
KW - Chalcogenide glassy films
KW - Chalcogenide photoresist
KW - Lift-off photolithography
UR - http://www.scopus.com/inward/record.url?scp=0348134606&partnerID=8YFLogxK
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AN - SCOPUS:0348134606
SN - 1454-4164
VL - 5
SP - 1361
EP - 1364
JO - Journal of Optoelectronics and Advanced Materials
JF - Journal of Optoelectronics and Advanced Materials
IS - 5
ER -