New application of inorganic chalcogenide photoresists in lift-off photolithography

M. Veinguer*, A. Feigel, B. Sfez, M. Klebanov, V. Lyubin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Abstract

The advantages of inorganic chalcogenide photoresists (ChP) were discussed. ChP films were used as photoresist for lift-off photolithography. The fabrication of gratings in layers of highly refractive As-Se-Te films was also analyzed. ChP were found to have very high resolution, photosensitivity in a wide spectral range, and they could be used on both planar and nonplanar substrates.

Original languageAmerican English
Pages (from-to)1361-1364
Number of pages4
JournalJournal of Optoelectronics and Advanced Materials
Volume5
Issue number5
StatePublished - 2003
Externally publishedYes

Keywords

  • Chalcogenide glassy films
  • Chalcogenide photoresist
  • Lift-off photolithography

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