Abstract
The advantages of inorganic chalcogenide photoresists (ChP) were discussed. ChP films were used as photoresist for lift-off photolithography. The fabrication of gratings in layers of highly refractive As-Se-Te films was also analyzed. ChP were found to have very high resolution, photosensitivity in a wide spectral range, and they could be used on both planar and nonplanar substrates.
| Original language | English |
|---|---|
| Pages (from-to) | 1361-1364 |
| Number of pages | 4 |
| Journal | Journal of Optoelectronics and Advanced Materials |
| Volume | 5 |
| Issue number | 5 |
| State | Published - 2003 |
| Externally published | Yes |
Keywords
- Chalcogenide glassy films
- Chalcogenide photoresist
- Lift-off photolithography
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