Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.
Bibliographical noteFunding Information:
E.M. thanks the Cambr Charitable Foundation for a doctoral fellowship.
This research was funded by the Israel Science Foundation, grant no. 229/17, and by the Israel Innovation Authority.
© 2023 by the authors.
- block copolymers
- directed self-assembly
- hierarchical structures
- thin films