On-axis phase-only computer-generated holograms based on a minimal etching process

Uriel Levy, David Mendlovic, Zeev Zalevsky

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Diffractive optical elements able to generate on-axis (zero-order) phase as well as amplitude distributions are described. The proposed elements are surface-relief plates, that is phase-only elements, that are based on concepts of computer-generated masks followed by lithographic and etching processes. The proposed encoding method assumes variable spatial partitioning of the cell and a fixed phase value allocated to each subcell. This method requires the minimal number of etching levels needed for full representation of the wave front, that is three, but can be applied with improved efficiency using more etching levels. The reconstructed amplitude and phase distributions contain some noise owing to the encoding process. Discussion of the error sources is given.

Original languageAmerican English
Pages (from-to)1437-1449
Number of pages13
JournalJournal of Modern Optics
Volume45
Issue number7
DOIs
StatePublished - Jul 1998
Externally publishedYes

Bibliographical note

Funding Information:
The authors acknowledge a fruitful discussion with Emanul Marom and Gal Shabtay. Uriel Levy acknowledge the Israeli Ministry of Science and the Arts for financial support.

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