TY - JOUR
T1 - Optical near-field lithography in chalcogenide films
AU - Noach, Salman
AU - Manevich, Michael
AU - Eisenberg, Naftali P.
AU - Davidov, Dan
AU - Klebanov, Matvey
AU - Lyubin, Victor
PY - 2006/6
Y1 - 2006/6
N2 - Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.
AB - Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.
UR - http://www.scopus.com/inward/record.url?scp=33747886249&partnerID=8YFLogxK
U2 - 10.1016/j.optmat.2005.06.004
DO - 10.1016/j.optmat.2005.06.004
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AN - SCOPUS:33747886249
SN - 0925-3467
VL - 28
SP - 1054
EP - 1057
JO - Optical Materials
JF - Optical Materials
IS - 8-9
ER -