Optical near-field lithography in chalcogenide films

Salman Noach; Michael Manevich; Naftali P. Eisenberg; Dan Davidov; Matvey Klebanov; Victor Lyubin

doi:10.1016/j.optmat.2005.06.004

Optical near-field lithography in chalcogenide films

Salman Noach^*
, Michael Manevich
, Naftali P. Eisenberg
, Dan Davidov
, Matvey Klebanov
, Victor Lyubin

^*Corresponding author for this work

Racah Institute of Physics

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As₂S₃ chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

Original language	English
Pages (from-to)	1054-1057
Number of pages	4
Journal	Optical Materials
Volume	28
Issue number	8-9
DOIs	https://doi.org/10.1016/j.optmat.2005.06.004
State	Published - Jun 2006

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10.1016/j.optmat.2005.06.004

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title = "Optical near-field lithography in chalcogenide films",

abstract = "Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.",

author = "Salman Noach and Michael Manevich and Eisenberg, \{Naftali P.\} and Dan Davidov and Matvey Klebanov and Victor Lyubin",

year = "2006",

month = jun,

doi = "10.1016/j.optmat.2005.06.004",

language = "אנגלית",

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T1 - Optical near-field lithography in chalcogenide films

AU - Noach, Salman

AU - Manevich, Michael

AU - Eisenberg, Naftali P.

AU - Davidov, Dan

AU - Klebanov, Matvey

AU - Lyubin, Victor

PY - 2006/6

Y1 - 2006/6

N2 - Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

AB - Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

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U2 - 10.1016/j.optmat.2005.06.004

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JF - Optical Materials

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ER -

Optical near-field lithography in chalcogenide films

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