OXYGEN CHEMISORPTION AND PHOTODESORPTION PROCESSES ON ZnO SURFACES.

David Eger*, Yehuda Goldstein, Abraham Many

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

51 Scopus citations

Abstract

Very strong accumulation layers with excess surface-electron densities of DELTA N equals 5 multiplied by 10**1**3 cm** minus **2 and higher have been obtained on single-crystal ZnO surfaces by photodesorption of oyxgen. The kinetics of oxygen chemisorption under such extreme accumulation conditions has been studied as a function of oxygen pressure, excess surface-electron density DELTA N, and temperature. The chemisorption rate is extremely slow and is directly proportional to the oxygen pressure. It is thermally activated with an activation energy of about 0. 25 eV. Both chemisorption and photodesorption rates vary exponentially with DELTA N. This is most surprising in view of the fact that an accumulation layer is present at the surface throughout the adsorption range studied. Possible models to account for the observed adsorption characteristics are discussed.

Original languageEnglish
Pages (from-to)508-530
Number of pages23
JournalR.C.A. Review
Volume36
Issue number3
StatePublished - 1975

Fingerprint

Dive into the research topics of 'OXYGEN CHEMISORPTION AND PHOTODESORPTION PROCESSES ON ZnO SURFACES.'. Together they form a unique fingerprint.

Cite this