Phase-sensitive bichromatic photoresistance in a two-dimensional electron gas

Q. Shi*, M. Khodas, A. Levchenko, M. A. Zudov

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

We have studied microwave photoresistance in a two-dimensional electron system subject to two radiation fields (frequencies ω1 and ω2) using quantum kinetic equation. We have found that when ω21=1+2/N, where N is an integer, and both waves have the same polarization, the displacement mechanism gives rise to a new, phase-sensitive photoresistance. This photoresistance oscillates with the magnetic field and can be a good fraction of the total photoresistance under typical experimental conditions. The inelastic mechanism, on the other hand, gives zero phase-sensitive photoresistance if the radiation fields are circularly polarized.

Original languageAmerican English
Article number245409
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume88
Issue number24
DOIs
StatePublished - 10 Dec 2013
Externally publishedYes

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