Phase transition in reactively co-sputtered films of VO2TiO2

I. Balberg; B. Abeles; Y. Arie

doi:10.1016/0040-6090(74)90175-8

Phase transition in reactively co-sputtered films of VO₂TiO₂

I. Balberg^*, B. Abeles, Y. Arie

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

43 Scopus citations

Abstract

Films of mixed oxides of VO₂ and TiO₂ were prepared by reactive co- sputtering. With the addition of TiO₂ to VO₂ the metal-non-metal resistive transition is shifted to higher temperatures and broadened considerably. In films containing more than 50 vol.% TiO₂ there is no evidence for the transition.

Original language	English
Pages (from-to)	307-310
Number of pages	4
Journal	Thin Solid Films
Volume	24
Issue number	2
DOIs	https://doi.org/10.1016/0040-6090(74)90175-8
State	Published - Dec 1974
Externally published	Yes

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title = "Phase transition in reactively co-sputtered films of VO2TiO2",

abstract = "Films of mixed oxides of VO2 and TiO2 were prepared by reactive co- sputtering. With the addition of TiO2 to VO2 the metal-non-metal resistive transition is shifted to higher temperatures and broadened considerably. In films containing more than 50 vol.% TiO2 there is no evidence for the transition.",

author = "I. Balberg and B. Abeles and Y. Arie",

year = "1974",

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doi = "10.1016/0040-6090(74)90175-8",

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AU - Abeles, B.

AU - Arie, Y.

PY - 1974/12

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N2 - Films of mixed oxides of VO2 and TiO2 were prepared by reactive co- sputtering. With the addition of TiO2 to VO2 the metal-non-metal resistive transition is shifted to higher temperatures and broadened considerably. In films containing more than 50 vol.% TiO2 there is no evidence for the transition.

AB - Films of mixed oxides of VO2 and TiO2 were prepared by reactive co- sputtering. With the addition of TiO2 to VO2 the metal-non-metal resistive transition is shifted to higher temperatures and broadened considerably. In films containing more than 50 vol.% TiO2 there is no evidence for the transition.

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Phase transition in reactively co-sputtered films of VO₂TiO₂

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