Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: An alternative approach for photo-lithography

Gabriel Kerner*, Ori Stein, Micha Asscher

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

Buffer Layer Assisted Laser Patterning (BLALP) method is presented, for patterning metallic layers on surfaces, using laser desorption of a physisorbed buffer layer, e.g. Xe, CO2 or H2O. This technique is based on the utilization of a low power laser pulse used as the photolithographic printer of a metallic thin film. Using a weakly bound buffer material as the template for laser patterning, led to the development of two complementary procedures, 'positive' and 'negative' BLALP. It is discussed as a potential alternative for standard photo-lithography, promising a cleaner, more cost effective, better resolution and more environmentally friendly procedure.

Original languageEnglish
Article numberA-38
Pages (from-to)128-136
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5513
DOIs
StatePublished - 2004
EventPhysical Chemistry of Interfaces and Nanomaterials III - Denver, CO, United States
Duration: 3 Aug 20046 Aug 2004

Keywords

  • Buffer layer
  • Laser patterning
  • LITD
  • Lithography

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