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Plasma imaging in the XUV wavelength range (175Å) using curved layered synthetic microstructure coated surfaces

  • S. P. Regan
  • , L. K. Huang
  • , M. Finkenthal
  • , H. W. Moos
  • , T. W. Barbee

Research output: Contribution to journalConference articlepeer-review

Abstract

A recently constructed calibration facility utilizing a Manson Soft X-ray Line Source in the wavelength range of 8-114Å and a Penning Ionization Discharge (PID) in the 100-350 Å range, has been used to map the reflectivity across a spherically curved (50cm radius of curvature) Layered Synthetic Microstructure (LSM) Mo/Si coated surface. This calibrated mirror (37% reflectivity with a 10Å bandpass at λ=175Å) was also used to image the Alin emission (λ= 170-175Å) from the PID.

Original languageEnglish
Pages (from-to)322-326
Number of pages5
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1546
DOIs
StatePublished - 1 Jan 1992
EventMultilayer and Grazing Incidence X-Ray/EUV Optics 1991 - San Diego, United States
Duration: 21 Jul 1991 → …

Bibliographical note

Publisher Copyright:
© 1992 SPIE. All rights reserved.

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