Prospects for electron beam aberration correction using sculpted phase masks

Roy Shiloh*, Roei Remez, Ady Arie

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

Technological advances in fabrication methods allowed the microscopy community to take incremental steps towards perfecting the electron microscope, and magnetic lens design in particular. Still, state of the art aberration-corrected microscopes are yet 20-30 times shy of the theoretical electron diffraction limit. Moreover, these microscopes consume significant physical space and are very expensive. Here, we show how a thin, sculpted membrane is used as a phase-mask to induce specific aberrations into an electron beam probe in a standard high resolution TEM. In particular, we experimentally demonstrate beam splitting, two-fold astigmatism, three-fold astigmatism, and spherical aberration.

Original languageEnglish
Pages (from-to)69-74
Number of pages6
JournalUltramicroscopy
Volume163
DOIs
StatePublished - 1 Apr 2016
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2016 Elsevier B.V..

Keywords

  • Aberration correction
  • Electron column
  • Phase-masks
  • Phase-plates
  • Thin film membranes

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