| Original language | English |
|---|---|
| Pages (from-to) | 219-222 |
| Number of pages | 4 |
| Journal | Microelectronic Engineering |
| Volume | 22 |
| Issue number | 1-4 |
| DOIs | |
| State | Published - Aug 1993 |
Radiation and high field induced interface state generation in MOS structures with modified nitrided oxide
J. Shappir*, T. Roter, J. Levinson
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review